How to Prevent Pritner Chips from Being Reverse - Engineered? (Core Protection Methods)
In response to the threats of reverse engineering, the toner chip design and manufacturing stages can adopt a three - fold approach of “physical protection + design protection + legal protection”:
Physical Protection: Increase the Difficulty of Deconstruction
Use anti - stripping/anti - etching coatings: Cover the wafer surface with special materials (such as metal oxides, high - molecular polymers) to prevent chemical reagents from stripping layer by layer;
3D integrated packaging technology: Stack multiple chips or circuit layers “stereoscopically” (such as TSMC's CoWoS packaging), making it difficult to completely restore the internal structure through planar imaging;
Deliberately design “physical confusion structures”: Add useless redundant circuit layers or irregular layouts to the chip to interfere with image stitching and circuit extraction during reverse - engineering.
Design Protection: Increase the Difficulty of Logical Reverse Deduction
Logic Obfuscation: Add “false logic gates” or “controllable redundant units” to the gate - level netlist, so that the netlist obtained through reverse - engineering cannot directly simulate the correct function (a specific “key” is required to activate the true logic);
Hardware Trojan Camouflage: Mix the core logic module with “decoy modules” to make it difficult for attackers to distinguish key functional units;
Use customized logic units: Do not use common logic gate libraries, but independently design transistor - level functional units, increasing the difficulty of “physical structure→logic gate” mapping.
Legal Protection: Define the Boundaries of Intellectual Property
Apply for intellectual property protection for the chip's circuit layout, gate - level netlist, and HDL code (such as China's “layout - design right of integrated circuits”, US chip patents);
Through supply chain management (such as signing confidentiality agreements with foundries), prevent the leakage of design files or wafers during the manufacturing stage, reducing the reverse - engineering risk from the source.